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首页> 外文期刊>Journal of Surface Analysis >Industrial standardization and quantification of the carrier concentration in semiconductor devices using electric SPM
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Industrial standardization and quantification of the carrier concentration in semiconductor devices using electric SPM

机译:使用电SPM的半导体器件中载流子浓度的工业标准化和量化

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摘要

Scanning capacitance microscopy (SCM) is one of techniques imaging two-dimensional carrier distribution in semiconductor devices. We have demonstrated that quantitative analysis of carrier concentration can be performed using calibration curves, which are statistically prepared for respective materials like silicon, silicon carbide, etc. The procedure was circulated to research organizations in domestic round robin test, and this method was found to be available from the viewpoint of comparability among users for the industrial standardization. It was also applied to other microscopes, and their profiles of carrier concentration coincide with each other, suggesting compatible to next-generation microscopes which would come up in the future.
机译:扫描电容显微镜(SCM)是对半导体器件中二维载流子分布进行成像的技术之一。我们已经证明,可以使用校准曲线对载流子浓度进行定量分析,该校准曲线是针对硅,碳化硅等各种材料进行统计制备的。该程序已分发给国内循环法研究机构,发现该方法可以从用户之间的可比性来看,可以实现工业标准化。它也被应用于其他显微镜,它们的载流子浓度曲线彼此重合,表明与将来出现的下一代显微镜兼容。

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