LITHOGRAPHIC APPARATUS, PROJECTION ASSEMBLY AND ACTIVE DAMPING

摘要

The lithographic apparatus includes a support configured to support a patterning device and an illumination system configured to condition a radiation beam . The lithographic apparatus comprises a substrate table configured to hold a substrate; And further comprises a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The projection system, the active damping system is provided to attenuate the vibration of at least part of the. The active damping system comprises a sensor for measuring the position of the projection system and the amount of the combination of the actuator exerts a force on the projection system in dependence on signals provided by the sensor. The active damping system is connected to a damping mass, the damping mass is connected to the projection system. ;