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Methods for Rapid Generation of ALD Saturation Curves Using Segmented Spatial ALD

机译:利用分段空间ALD快速生成ALD饱和度曲线的方法

摘要

Systems and methods for rapid generation of ALD saturation curves using segmented spatial ALD are disclosed. Methods include introducing a substrate, having a plurality of substrate segment regions, into a processing chamber. The substrate may be disposed upon a pedestal within the chamber. Sequentially exposing the plurality of segment regions to a precursor within the chamber at a first processing temperature. Afterwards, purging the precursor from the chamber and then sequentially exposing each plurality of segment regions to a reactant within the chamber at the first processing temperature. Afterwards, purging the reactant from the chamber. Repeat sequentially exposing the plurality of segment regions to the precursor and the reactant for a plurality of cycles. Each segment region may be sequentially exposed to the precursor for a unique processing time. The pedestal may be rotated prior to exposing each next segment region to the precursor and the reactant.
机译:公开了使用分段空间ALD来快速生成ALD饱和度曲线的系统和方法。方法包括将具有多个衬底段区域的衬底引入处理室。可以将基板设置在腔室内的基座上。在第一处理温度下将多个片段区域顺序地暴露于腔室内的前体。之后,从腔室中清除前驱物,然后在第一处理温度下将每个多个段区域顺序地暴露于腔室内的反应物。之后,从反应室中清除反应物。重复上述步骤,将多个段区域依次暴露于前体和反应物中,进行多个循环。每个段区域可以在唯一的处理时间内顺序地暴露于前体。在将每个下一个分段区域暴露于前体和反应物之前,可以旋转基座。

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