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Apparatus and methods for wafer rotation to improve spatial ALD process uniformity
Apparatus and methods for wafer rotation to improve spatial ALD process uniformity
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机译:用于晶圆旋转以改善空间ALD工艺均匀性的设备和方法
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摘要
Apparatus and methods for rotating wafers during processing include a wafer rotation assembly with a support fixture connected to a shaft and a wafer transfer assembly with a robot blade with an opening therethrough, the opening sized to allow the support surface of the support fixture to pass through the opening. A first actuator is connected to the wafer rotation assembly to rotate the support fixture assembly about an axis of the shaft. A second actuator is connected to the wafer rotation assembly to move the support fixture assembly a stroke distance along the axis of the shaft. Process kits including the wafer rotation assemblies and robot blades with openings can used to retrofit existing mainframe processing chambers.
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