OPTIMIZING LITHOGRAPHY MASKS FOR VLSI CHIP DESIGN

摘要

In one embodiment, a computer-implemented method includes accessing mask input data. The mask input data includes a mathematical representation of a mask in a mask representation space, where the mask is configured to create an integrated circuit microprocessor. A set of values is obtained based on a derivative of the mask input data. The set of values is optimized, by a computer processor, in a derivative domain to obtain optimized mask data. The optimized mask data is transformed into the mask representation space to obtain printable mask output data.