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Lithography mask design through mask functional optimization and spatial frequency analysis
Lithography mask design through mask functional optimization and spatial frequency analysis
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机译:通过掩模功能优化和空间频率分析的光刻掩模设计
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摘要
In an electronic design automation technique for optical proximity correction, a mask is represented by a function with an exact analytical form over a mask region. Using the physics of optical projection, a solution based on a spatial frequency analysis is determined. Spatial frequencies above a cutoff are determined by the optical system do not contribute to the projected image. Spatial frequencies below this cutoff affect the print (and the mask), while those above the cutoff only affect the mask. Frequency components in the function below this cutoff frequency may be removed, which will help to reduce computational complexity.
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