Non-volatile memory (NVM) and high-K and metal gate integration using gate-last methodology

摘要

A method of making a semiconductor structure includes forming a select gate over a substrate in an NVM region and a first protection layer over a logic region. A control gate and a storage layer are formed over the substrate in the NVM region. The control gate has a top surface below a top surface of the select gate. The charge storage layer is under the control gate, along adjacent sidewalls of the select gate and control gate, and is partially over the top surface of the select gate. A second protection layer is formed over the NVM portion and the logic portion. The first and second protection layers are removed from the logic region. A portion of the second protection layer is left over the control gate and the select gate. A gate structure, formed over the logic region, has a high k dielectric and a metal gate.