Mirror blank for EUV lithography that does not expand under EUV irradiation

摘要

The present invention relates to a substrate for an EUV mirror having a zero crossing temperature profile deviating from a statistical distribution. The invention further relates to a method of manufacturing a substrate for an EUV mirror in which the profile of the zero crossing temperature in the substrate is adapted to the operating temperature of the mirror, the use of the substrate and a lithography method using such a substrate.