Ag ALLOY SPUTTERING TARGET, PRODUCTION METHOD OF Ag ALLOY SPUTTERING TARGET, Ag ALLOY FILM AND PRODUCTION METHOD OF Ag ALLOY FILM

摘要

PROBLEM TO BE SOLVED: To provide an Ag alloy sputtering target capable of depositing an Ag alloy film excellent in an electric characteristic, an optical characteristic and environmental resistance; and to provide a production method of the Ag alloy sputtering target, an Ag alloy film and a production method of the Ag alloy film.SOLUTION: An Ag alloy sputtering target has a composition containing Sn in the range of 0.1 atom% or more and 3.0 atom% or less, and Cu in the range of 1.0 atom% or more and 10.0 atom% or less, and having a residue comprising Ag and inevitable impurities.SELECTED DRAWING: None