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Characterization of Magnetron Sputtered Copper-Nickel Thin Film and Alloys.

机译：磁控溅射铜镍薄膜及合金的表征。

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Zakar, E.; Chen, A.; Burke, R.; Hirsch, S. G.; Strnad, N.; Mulcahy, J.;
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年度 2016
页码 1-18
总页数 18
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正文语种 eng
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1. CHARACTERIZATION OF BISMUTH OXIDE THIN FILMS DEPOSITED VIA UNBALANCED MAGNETRON SPUTTERING ( CARACTERIZACIóN DE PELíCULAS DELGADAS DE OXIDO DE BISMUTO DEPOSITADAS MEDIANTE SPUTTERING CON MAGNETRON DESBALANCEADO ) [J] . Giovany Orozco-Hernández, Laura López-Córdoba, Helber Esquivel-Puentes, Revista Latinoamericana de Metalurgia y Materiales . 2017,第2期

机译：通过不平衡磁控溅射法沉积的氧化铋薄膜的特征。
2. Characterization of aluminum-doped zinc oxide thin films by RF magnetron sputtering at different substrate temperature and sputtering power [J] . Hung-Wei Wu, Ru-Yuan Yang, Chin-Min Hsiung, Journal of materials science . 2013,第1期

机译：射频磁控溅射在不同衬底温度和溅射功率下表征铝掺杂氧化锌薄膜
3. Deposition and characterization of ternary thin films within the Ti-Al-C system by DC magnetron sputtering [J] . Wilhelmsson O, Palmquist JP, Lewin E, Journal of Crystal Growth . 2006,第1期

机译：直流磁控溅射在Ti-Al-C系统中沉积和表征三元薄膜
4. Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering [C] . Aspanut Z., Wah C.K., Kong C.S., Nanoelectronics Conference (INEC), 2010 . 2010

机译：射频磁控溅射共溅射Au / SiO 2 薄膜的制备与表征
5. Characterization of tantalum nitride thin films synthesized by magnetron sputtering. [D] . Zaman, Anna. 2014

机译：磁控溅射合成氮化钽薄膜的表征。
6. HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering [O] . A. Faudoa-Arzate, A. Arteaga-Durán, R.J. Saenz-Hernández, 2017

机译：反应性射频磁控溅射沉积β-WO3薄膜的HRTEM显微结构表征
7. Reactive sputtering of delta-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering [O] . Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, 2014

机译：高功率脉冲磁控溅射和直流磁控溅射反应溅射ZrH2薄膜

Characterization of Magnetron Sputtered Copper-Nickel Thin Film and Alloys.

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