HEATER MEMBER AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

摘要

The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention comprises: a processing chamber; substrate susceptor, installed in the processing chamber, which rotates in connection with a rotary shaft, a plurality of substrates being disposed on the same plane thereof; a heater member located on the lower surface of the substrate susceptor; and a spraying member for spraying a gas onto the entire processing surface of the substrate at a position corresponding to each of the plurality of substrates disposed on the substrate susceptor, wherein the heater member has an inner space in which heating wires for heating the substrate susceptor are arranged in a plurality rows of verticality and horizontality in a concentric circle based on the rotary shaft of the substrate susceptor.