首页> 外国专利> COMPLEMENTARY THIN FILM TRANSISTOR DRIVING BACK PLATE AND PREPARING METHOD THEREOF, AND DISPLAY DEVICE

COMPLEMENTARY THIN FILM TRANSISTOR DRIVING BACK PLATE AND PREPARING METHOD THEREOF, AND DISPLAY DEVICE

机译:互补型薄膜晶体管驱动背板及其制备方法和显示装置

摘要

A complementary thin film transistor driving back plate and a preparing method thereof, and a display device are disclosed. The preparing method comprises: forming a lower electrode (102) on a base substrate (101); sequentially disposing a continuously grown dielectric layer (103), a semiconductor layer (104), and a diffusion protection layer (105); sequentially forming a no-photoresist region (107), an N-type thin film transistor preparation region (108), and a P-type thin film transistor preparation region (109); removing a photoresist layer (114) of the N-type thin film transistor preparation region (108); removing a diffusion protection layer (105) of the N-type thin film transistor preparation region (105); removing a photoresist layer (114) of the P-type thin film transistor preparation region (109); performing an oxidation treatment to the base substrate (101); disposing a passivation layer (111) on the base substrate (101); and forming an upper electrode (113) on the passivation layer (111).
机译:本发明公开了一种互补薄膜晶体管驱动背板及其制备方法和显示装置。该制备方法包括:在基底基板( 101 )上形成下部电极( 102 );依次设置连续生长的介电层( 103 ),半导体层( 104 )和扩散保护层( 105 );依次形成无光致抗蚀剂区域( 107 ),N型薄膜晶体管准备区域( 108 )和P型薄膜晶体管准备区域(< B> 109 );去除N型薄膜晶体管制备区( 108 )的光刻胶层( 114 );去除N型薄膜晶体管制备区( 105 )的扩散保护层( 105 );去除P型薄膜晶体管制备区( 109 )的光刻胶层( 114 );对基础基板( 101 )进行氧化处理;在基底基板( 101 )上设置钝化层( 111 );在钝化层( 111 )上形成上电极( 113 )。

著录项

  • 公开/公告号US2015325605A1

    专利类型

  • 公开/公告日2015-11-12

    原文格式PDF

  • 申请/专利权人 BOE TECHNOLOGY GROUP CO. LTD.;

    申请/专利号US201414416872

  • 发明设计人 GANG WANG;XIAODI LIU;

    申请日2014-05-27

  • 分类号H01L27/12;H01L27/092;H01L21/8238;H01L21/02;H01L21/383;H01L29/786;H01L21/477;

  • 国家 US

  • 入库时间 2022-08-21 14:37:56

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