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SEMICONDUCTOR DEVICE COMPRISING PLANAR GATE AND TRENCH FIELD ELECTRODE STRUCTURE
SEMICONDUCTOR DEVICE COMPRISING PLANAR GATE AND TRENCH FIELD ELECTRODE STRUCTURE
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机译:包含平面门和沟槽场电极结构的半导体器件
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摘要
An embodiment of a semiconductor device includes a transistor cell array having transistor cells in a semiconductor body. A planar gate structure is on the semiconductor body at a first side. Field electrode trenches extend into the semiconductor body from the first side. Each of the field electrode trenches includes a field electrode structure. A depth d of the field electrode trenches is greater than a maximum lateral dimension wmax of the field electrode trenches at the first side.
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