ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

摘要

Disclosed is an active-ray-sensitive or radiation-sensitive resin composition comprising: a compound (A), the rate of dissolution of which with respect to an alkaline developing solution is reduced by the action of an acid; a resin (B) including a group that decomposes by the action of an alkaline developing solution and increases the degree of dissolution to the alkaline developing solution, the resin (B) including a fluorine atom and/or a silicon atom; and a resin (C) that is different from the resin (B) and includes a phenolic hydroxyl group. Also disclosed are: an active-ray-sensitive or radiation-sensitive film formed by using said active-ray-sensitive or radiation-sensitive resin composition; a mask blank; a pattern formation method using said active-ray-sensitive or radiation-sensitive resin composition; and a method for producing an electronic device.