RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-APPLICATION MASK BLANKS, RESIST-PATTERNING METHOD, AND PHOTOMASK

摘要

Sensitive active or radiation sensitive resin composition is a polymer compound (A) having a phenolic hydroxyl group and satisfying the following conditions (a) and (b), a compound capable of generating an acid upon irradiation with an actinic ray or radiation B), and a cross-linking agent (C) having a glass transition temperature (Tg) of 200 ° C or higher, which crosslinks the polymer compound (A) by the action of an acid. (a) a weight average molecular weight of not less than 3000 and not more than 6500 (b) a glass transition temperature (Tg) of 140 DEG C or higher