ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND PHOTOMASK USING THE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition from which a pattern can be formed, satisfying high resolution and good dry etching resistance at higher levels, and to provide a resist film, a resist-coated mask blank, a method for forming a resist pattern, and a photomask using the resin composition.;SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises: a polymeric compound (A) that has a phenolic hydroxyl group and satisfies conditions (a) and (b) described below; a compound (B) that generates an acid by irradiation with actinic rays or with radiation; and a crosslinking agent (C) that crosslinks the polymeric compound (A) by an action of an acid and has a glass transition temperature (Tg) of 200°C or higher. (a) The weight average molecular weight is 3000 or more and 6500 or less, and (b) a glass transition temperature (Tg) is 140°C or higher.;COPYRIGHT: (C)2015,JPO&INPIT