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A DONOR SUBSTRATE FOR DEPOSITING AN ORGANIC LAYER USING JOULE-HEATING
A DONOR SUBSTRATE FOR DEPOSITING AN ORGANIC LAYER USING JOULE-HEATING
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机译:用于通过焦耳加热沉积有机层的施主基质
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摘要
The present invention provides a substrate, comprising: a substrate; depositing a conductive metal film on one surface of the substrate followed by patterning; forming a partition wall layer on the patterned conductive metal film; forming a photoresist on the partition wall layer; Removing the photoresist in a region corresponding to the patterned conductive metal film by a backside exposure process using the patterned conductive metal film as a mask on the opposite surface on which the film is deposited, A method of manufacturing an organic film barrier donor substrate for depositing an organic film by using a jelly including removing portions corresponding to the conductive metal film and removing the remaining photoresist, and a donor substrate manufactured thereby, There is provided a donor substrate structure capable of forming a uniform organic film pattern during the deposition of an organic film by using the donor substrate, and a method of manufacturing a donor substrate which can form a barrier pattern having a simple process and excellent pattern accuracy in order to obtain the donor substrate structure Can be.;
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