A DONOR SUBSTRATE FOR DEPOSITING AN ORGANIC LAYER USING JOULE-HEATING

摘要

The present invention provides a donor substrate, a conductive layer for line heating on the donor substrate, a barrier layer on the conductive layer for line heating, Forming an outgassing barrier layer on the surface of the patterned barrier layer and the exposed conductive layer for heating by using an atomic layer deposition method; In the case where the organic film on the donor substrate is deposited on the element substrate by using line heating to deposit the organic film layer on the element substrate by providing the method of manufacturing the substrate and the donor substrate used thereon, An upper surface of the layer is formed of an inorganic film by an atomic layer deposition method, so that an electric field is applied to the donor substrate to heat the organic film, It is possible to effectively prevent the outgassing of the organic film as the barrier rib layer from occurring, to prevent the accuracy of the emission pattern formed on the element substrate from being lowered, to prevent contamination of the element substrate, .