DONOR SUBSTRATE FOR DEPOSITING ORGANIC LAYER TO DEPOSIT ORGANIC LAYER BY USING JOULE-HEATING

摘要

The purpose of the present invention is to provide a donor substrate structure to form a stable organic layer pattern in depositing an organic layer by using joule-heating and a method to manufacture a donor substrate to form a partition wall pattern formed with a simple process and having a good pattern accuracy to obtain the donor substrate structure. The present invention relates to a method to manufacture a donor substrate and a donor substrate for depositing an organic layer to deposit an organic layer by using joule-heating. The method to manufacture a donor substrate comprises: providing a substrate; patterning a conductive metal layer after depositing the conductive metal layer on a surface of the substrate; forming a partition wall layer on the patterned conductive metal layer; depositing photoresist on the partition wall layer; removing the photoresist on a region corresponding to the conductive metal layer patterned by rear exposure processing by using the patterned conductive metal layer as a mask on a surface opposite to the surface in which the conductive metal layer is deposited; removing a part corresponding to the conductive metal layer of the partition wall with etchting liquid by using the photoresist as a mask; and removing the other photoresist.;COPYRIGHT KIPO 2016