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FIELD-EFFECT TRANSISTOR ON GAS PHASE-PRECIPITATED DIAMOND FILM WITH DELTA-DOPED CONDUCTIVE CHANNEL

机译:带三角形掺杂导电通道的气态金刚石薄膜的场效应晶体管

摘要

FIELD: instrument engineering.;SUBSTANCE: in the field-effect transistor on vapor-deposited diamond film with delta-doped conductive channel including non-doped diamond substrate, deposited on it from gas phase diamond film consisting of applied successively non-doped buffer layer, thin delta-doped layer and non-doped cover layer, as well as metal source and drain contacts and locking contact separated from the cover layer by insulator layer, doped delta-layer of delta-doped conductive channel is deposited from gas phase in such a way that concentration profile of dopant in delta-doped conducting channel has two symmetrical relative to the centre of delta-doped conductive channel and separated by distance of not more than 3 nm of maximum, between which there is a local minimum, in the centre of which concentration of dopant is one order less than in peaks.;EFFECT: invention provides faster operation of transistor.;1 cl, 5 dwg
机译:领域:仪器工程;研究方向:在具有三角形掺杂导电沟道的气相沉积金刚石膜中的场效应晶体管中,该导电沟道包括非掺杂金刚石基底,并由气相金刚石膜沉积在其上,该气相金刚石膜由连续施加的非掺杂缓冲层组成薄的δ掺杂层和​​非掺杂覆盖层,以及通过绝缘层将金属源极和漏极接触与锁定接触通过覆盖层与覆盖层隔离,​​从而在气相中沉积δ掺杂导电通道的delta层。一种方式,使掺杂掺杂的导电通道中的掺杂剂浓度分布相对于掺杂掺杂的导电通道的中心具有两个对称的位置,并且在中心处相隔的最大距离不超过3 nm,在该距离之间存在局部最小值效果:本发明提供了更快的晶体管操作; 1 cl,5 dwg

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