METHOD OF FABRICATING A BEAM-DEFINING APERTURE FOR A FOCUSED ION BEAM AND BEAM DEFINITION OF A FOCUSED ION BEAM WITH SUCH AN APERTURE

摘要

An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening (432) is made in a thin conductive film (420) positioned over a cavity (430) in a support substrate (410), where the aperture size and shape is determined by the opening in the conductive film and not determined by the cavity in the substrate.