BISMUTH GERMANIUM OXIDE SPUTTERING TARGET AND BISMUTH GERMANIUM OXIDE LAYER

摘要

PROBLEM TO BE SOLVED: To provide a bismuth germanium oxide (BGO) sputtering target for optical recording media, having bending strength more excellent than before, and a BGO layer.SOLUTION: The BGO sputtering target includes Bi atoms, germanium atoms and O atoms and has 0.4-0.57 of a ratio of Bi atoms to the total of Bi atoms and germanium atoms. A crystal structure has BiGeO, BiGeOor a combination thereof and further, preferably, includes C, Si, Sn, Pb, Ti, Zr, Ce, Th or combinations thereof. The bending strength is, preferably, 45 MPa or more.SELECTED DRAWING: None