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Ultrasonic attenuation in bismuth silicon oxide and bismuth germanium oxide.

机译:氧化铋铋和氧化锗铋的超声衰减。

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摘要

The propagation of ultrasonic waves has been studied in single crystals of undoped and doped bismuth germanium oxide (Bi12GeO20) and undoped bismuth silicon oxide(Bi12SiO20). These crystals are piezoelectric (Cubic Space Group I23) and direct excitation of ultrasound was used wherever possible. Attenuation measurements were made from 10 to 190 MHz over the temperature range 4.2 to 260 K.;The magnitude of the attenuation peak in doped BGO samples is strongly dependent on the presence of dopants. Doping with Al, Ga, Pb, P + Ga, Ga+Cr, all removed the attenuation peak, while Cr increased it and Zn reduced it. A strong correlation was observed between the attenuation peak, the colour of the crystals and the optical absorption just below the band gap measured in these samples by other workers. These results indicate that the same defect centre is responsible for both the optical and the ultrasonic absorption. Possible defects are discussed taking the optical absorption, X-ray diffraction, EPR and other available measurements into consideration.;The ultrasonic attenuation was measured before and after annealing at 450°C in vacuo or in pure oxygen. No change was observed for an undoped sample. However, for the Cr doped sample the attenuation was reduced by vacuum annealing and restored by oxygen annealing. This seems to be closely related to previous observations of photo-chromic behaviour in BSO doped with Cr. Measurements were also made to study the effects of gamma irradiation on the attenuation in undoped BSO.;A large attenuation peak was observed in the undoped crystals between 35 and 50 K for only those ultrasonic modes whose velocity depends on the elastic modulus C44 This peak is shown to be a single anelastic relaxation peak and is interpreted as due to point defects. Using the selection rules for anelastic relaxation in cubic crystals, it is deduced that these defects must have trigonal symmetry.
机译:研究了在未掺杂和掺杂的铋锗氧化物(Bi12GeO20)和未掺杂铋的硅氧化物(Bi12SiO20)的单晶中的超声波传播。这些晶体是压电晶体(Cubic Space Group I23),并在可能的情况下使用超声的直接激发。在4.2至260 K的温度范围内,从10至190 MHz进行了衰减测量;掺杂的BGO样品中衰减峰的大小在很大程度上取决于掺杂剂的存在。掺杂Al,Ga,Pb,P + Ga,Ga + Cr都可以消除衰减峰,而Cr可以增加衰减峰,Zn可以减少衰减峰。观察到衰减峰值,晶体的颜色和光吸收之间的强相关性,这些吸收正好在其他工作人员在这些样品中测得的带隙以下。这些结果表明,同一缺陷中心负责光学和超声吸收。讨论了可能的缺陷,同时考虑了光吸收,X射线衍射,EPR和其他可用的测量方法。超声衰减是在真空或纯氧气中于450°C退火前后测量的。未掺杂样品未观察到变化。然而,对于Cr掺杂的样品,通过真空退火减少了衰减,并且通过氧退火恢复了衰减。这似乎与先前在掺铬的BSO中光致变色行为的观察结果密切相关。还进行了测量以研究γ辐照对未掺杂BSO衰减的影响。;仅对于那些速度取决于弹性模量C44的超声模式,在35至50 K之间的未掺杂晶体中观察到了大的衰减峰。所示为单个非弹性弛豫峰,并解释为由于点缺陷。使用立方晶体中非弹性弛豫的选择规则,可以推断出这些缺陷必须具有三角对称性。

著录项

  • 作者

    Sandhu, Parmjit Kaur.;

  • 作者单位

    University of London, Bedford College (United Kingdom).;

  • 授予单位 University of London, Bedford College (United Kingdom).;
  • 学科 Acoustics.
  • 学位 Ph.D.
  • 年度 1980
  • 页码 224 p.
  • 总页数 224
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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