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Temperature Dependence of Drift Mobility in Bismuth Germanium Oxide and Bismuth Silicon Oxide

机译:氧化铋锗和氧化铋铋漂移漂移的温度依赖性

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We have measured the temperature dependence of the electron mobility between approx 200 K and 300 K in undoped and 0.3percent Fe-doped Bi_(12)GeO_(20) (BGO) and undoped Bi_(12)SiO_(20) (BSO) using a time-of-flight (TOF) technique. We were able to measure electron current transients over a wide temperature range. We found that mobilities calculated from the observed transit times were independent of sample thickness and applied voltage, but depended approximately exponentially on temperature. The hole current transients were very weak and featureless, so we were unable to measure mobilities for holes.
机译:我们使用以下方法测量了在未掺杂和0.3%Fe掺杂的Bi_(12)GeO_(20)(BGO)和未掺杂Bi_(12)SiO_(20)(BSO)中约200 K至300 K之间电子迁移率的温度依赖性飞行时间(TOF)技术。我们能够在很宽的温度范围内测量电子电流的瞬变。我们发现,根据观察到的传输时间计算出的迁移率与样品厚度和施加的电压无关,但大致取决于温度。空穴电流瞬变非常弱且没有特征,因此我们无法测量空穴的迁移率。

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