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Temporary fixing film, temporary fixing film sheet, and method of manufacturing semiconductor device

机译:临时定影膜,临时定影膜片以及半导体装置的制造方法

摘要

A method for producing a semiconductor device having a semiconductor element obtained by dividing a semiconductor wafer comprises a temporary securing step of arranging a temporary securing film between a support member and the semiconductor wafer so as to temporarily secure the support member and the semiconductor wafer to each other; a grinding step of grinding a surface on the side opposite from the temporary securing film of the semiconductor wafer temporarily secured to the support member, and a semiconductor wafer peeling step of peeling the temporary securing film from the ground semiconductor wafer, wherein a semiconductor wafer edge-trimmed on an outer peripheral part of a surface opposing the support member is used as the semiconductor wafer, and the temporary securing step arranges the temporary securing film on the inside of the edge-trimmed part.
机译:用于制造具有通过划分半导体晶片而获得的具有半导体元件的半导体器件的方法,包括临时固定步骤,该临时固定步骤是在支撑构件和半导体晶片之间布置临时固定膜,以将支撑构件和半导体晶片分别临时固定到每个其他;研磨步骤为:将与暂时固定在支撑构件上的半导体晶片的临时固定膜相反的一侧的面进行研磨的工序;以及从被研磨的半导体晶片上剥离临时固定膜的半导体晶片剥离工序,其中,半导体晶片的边缘-在与支撑构件相对的表面的外边缘上修整的边缘被用作半导体晶片,并且临时固定步骤将临时固定膜布置在边缘修整的部分的内部。

著录项

  • 公开/公告号JP6209876B2

    专利类型

  • 公开/公告日2017-10-11

    原文格式PDF

  • 申请/专利权人 日立化成株式会社;

    申请/专利号JP20130134149

  • 发明设计人 川守 崇司;増子 崇;祖父江 省吾;

    申请日2013-06-26

  • 分类号H01L21/304;C09J179/08;C09J11/04;C09J11/06;C09J4;C09J163;C09J123;C09J183/04;C09J7/02;H01L21/301;

  • 国家 JP

  • 入库时间 2022-08-21 13:58:48

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