Reaction induction unit and substrate processing apparatus, and thin film deposition method

摘要

The present invention provides a substrate processing apparatus. A substrate processing apparatus according to the present invention includes a process chamber, a substrate susceptor installed in the process chamber and having a plurality of substrates placed on the same plane and connected to a rotating shaft and rotated, and a substrate susceptor provided on the bottom surface of the substrate susceptor A reaction induction unit for injecting a gas to a processing surface of a substrate at a position corresponding to each of a plurality of substrates placed on the substrate susceptor, wherein the reaction induction unit includes at least three The above-described stacked plate can have a flow path of a multilayer composite structure.BACKGROUND OF THE INVENTION