THIN FILM DEPOSITION APPARATUS, A SUBSTRATE PROCESSING APPARATUS, A THIN FILM DEPOSITION METHOD, AND A COMPUTER READABLE STORAGE MEDIA, CAPABLE OF INCLUDING A VACUUM CHAMBER AND A TURN-TABLE IN WHICH A PLURALITY OF WAFERS IS LOADED ALONG A TURNING DIRECTION

摘要

PURPOSE: A thin film deposition apparatus, a substrate processing apparatus, a thin film deposition method, and a computer readable storage media are provided to improve the yield of a thin film deposition process by alternately supplying at least two source gases to a substrate.;CONSTITUTION: A turn-table(2) is installed in a vacuum chamber(1) A substrate receiving part is installed in order to load substrate on the turn-table. A core part(21) is fixed to the upper side of a turning shaft(22) expanded to a vertical direction. The turning shaft and a driving unit(23) are arranged in a case main body(20). An exhaust opening is installed to the vacuum chamber in order to exhaust gas in the vacuum chamber.;COPYRIGHT KIPO 2011