首页> 外国专利> CRYSTALLINE SILICON INGOT INCLUDING NUCLEATION PROMOTION LAYER AND METHOD OF FABRICATING THE SAME

CRYSTALLINE SILICON INGOT INCLUDING NUCLEATION PROMOTION LAYER AND METHOD OF FABRICATING THE SAME

机译:包含成核促进层的结晶硅锭及其制造方法

摘要

A poly-crystalline silicon ingot having a bottom and defining a vertical direction includes a plurality of silicon grains grown in the vertical direction, in which the plurality of the silicon grains have at least three crystal orientations; and a nucleation promotion layer comprising a plurality of chips and chunks of poly-crystalline silicon on the bottom, wherein the poly-crystalline silicon ingot has a defect density at a height ranging from about 150 mm to about 250 mm of the poly-crystalline silicon ingot that is less than 15%.
机译:一种具有底部并限定垂直方向的多晶硅锭,其包括在垂直方向上生长的多个硅晶粒,其中所述多个硅晶粒具有至少三个晶体取向。在底部具有包括多个芯片和大块多晶硅的成核促进层,其中,所述多晶硅锭在所述多晶硅的约150mm至约250mm的高度范围内具有缺陷密度。少于15%的锭。

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