首页>
外国专利>
PROCESSING METHOD OF ETCHING BLACK PHOSPHORUS TWO-DIMENSIONAL MATERIAL USING OXYGEN PLASMA
PROCESSING METHOD OF ETCHING BLACK PHOSPHORUS TWO-DIMENSIONAL MATERIAL USING OXYGEN PLASMA
展开▼
机译:利用氧等离子体提取黑色磷二维材料的加工方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Provided is a processing method of etching a black phosphorus two-dimensional material member using an oxygen plasma. The method comprises the following steps: etching a multi-layer black phosphorus two-dimensional material member using an oxygen plasma, wherein the multi-layer black phosphorus two-dimensional material member is etched to be a thin black phosphorus two-dimensional material member having a target number of layers; and forming a phosphorus oxide protection layer on a surface of the thin black phosphorus two-dimensional material member. The present invention can realize accurate control of the layer number of a black phosphorus two-dimensional material member and suppress degradation of the black phosphorus two-dimensional material in the ambient atmosphere, thus significantly increasing the effective existing duration of the black phosphorus two-dimensional material in room temperature and ambient atmosphere, and preventing the black phosphorus two-dimensional material from contamination in further processing. The method further comprises a passivation processing step to further increase the lifespan of the oxidization-etched black phosphorus two-dimensional material via adding a second protection layer.
展开▼