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Coating materials that are chemically compatible with particle performance on advanced device wafers
Coating materials that are chemically compatible with particle performance on advanced device wafers
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机译:与先进设备晶片上的颗粒性能化学相容的涂料
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摘要
To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.
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机译:为了制造用于半导体处理室的制品的涂层,该制品包括Al,Al 2 O 3或SiC中的至少一种的主体以及在该主体上的陶瓷涂层。陶瓷涂层包括包含以下各项的化合物:Y 2 O 3在大约50mol%至大约75mol%的范围内,ZrO 2在大约10mol%至大约30mol%的范围内,并且Al 2 O 3在大约10mol%至大约30mol%的范围内。摩尔%,其中每英寸结节的数量在约30个结节至约45个结节的范围内,并且孔隙率在约2.5%至约3.2%的范围内。
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