- CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE

摘要

To fabricate a coating for an article for a semiconductor processing chamber, the article comprises a body of at least one of Al, Al ₂ O ₃ , or SiC, and a ceramic coating on the body. The ceramic coating comprises Y ₂ O _{3 in the} range of about 50 mol% to about 75 mol%, ZrO _{2 in the} range of about 10 mol% to about 30 mol%, and Al ₂ O ₃ in the range of about 10 mol% to about 30 mol%. Included compounds include, wherein the number of nodules per inch ranges from about 30 nodules to about 45 nodules, and the porosity ranges from about 2.5% to about 3.2%.