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METHOD AND DEVICE FOR TREATING THE UNDERSIDE OF A SUBSTRATE

机译:用于处理基板底面的方法和设备

摘要

A method for treating the underside of a planar substrate with a treatment medium includes hydrophobizing the underside of the substrate, subsequently forming a protective liquid film on a top side of the substrate and then bringing the treatment medium into contact with the underside of the substrate. In the process, the protective liquid film protects the upper side of the substrate from any action or effect of the treatment medium and/or outgassing. A device for carrying out the method is also provided.
机译:用处理介质处理平面基板的底面的方法包括疏水化基板的底面,随后在基板的顶面上形成保护性液膜,然后使处理介质与基板的底面接触。在该过程中,保护性液体膜保护基材的上侧不受处理介质的任何作用或影响和/或除气。还提供了用于执行该方法的设备。

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