Faraday cage modified and deposition process of thin films in an environment of plasma

摘要

This device is a assessu00f3rio for internal use in the plasma reactor as a Faraday cage modified and deposition process of thin films in the plasmu00f3dicos environments.Specially developed for the deposition of thin films of various metallic or non-metallic materials.In order to meet the study of technological development of new alloys with mechanical properties, electrical.Physical and chemical applications and other researches on technologies of surfaces.In this way, it is developed for a wide range of deposition of thin films or films on the surfaces of various materials nanos, via vacuum plasma reactors.In addition, with the deposition of thin films on the surfaces of objects may occur, increased wear resistance, corrosion.The electrical and optical properties and embellishment in the case of objects of adornment, among other characteristics.