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Growth, characterization and electron field emission measurements from thin film cold cathode materials fabricated by a modified microwave plasma assisted chemical vapor deposition diamond process.

机译:通过改进的微波等离子体辅助化学气相沉积金刚石工艺制造的薄膜冷阴极材料的生长,表征和电子场发射测量。

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摘要

This thesis presents the results of electron field emission measurements on thin film cold cathode fabricated by a modified microwave plasma assisted chemical vapor deposition diamond process. Specifically, the modification is due to the addition of nitrogen and oxygen, in varying ratios, to the growth plasma. The thin films were grown on polished molybdenum substrates. The growth conditions were for a constant methane (10%CH4/H2) and hydrogen (H2) concentration of 60:40 at T = 900–950°C. The nitrogen oxygen ratios, N2/O2, ranged from 1:1 to 50:1. In addition films were grown with just nitrogen and just oxygen.; Characterization of the thin film materials has been carried out by x-ray diffraction, scanning electron microscopy, x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy and Raman spectroscopy. The results indicate that the material is a disordered tetrahedrally bonded carbon with crystal size of 10–100nm. The disorder of the material results in a departure from the cubic symmetry of the diamond lattice. This symmetry breaking is a result of stacking faults and nano-twinning.; The field emission results indicate that certain N2/O 2 ratios and film thicknesses show low turn on fields and current densities desirable for cold cathode devices. Specifically, N2/O2 = 33–50 and film thickness = 1–2 microns (μm) are shown to be the most desirable. Turn on fields as low as 1–2 V/ μm and current densities of >1mA/cm2 have been measured. Comparisons of films grown in this study with polycrystalline diamond films grown by a multiple laser process have been made.; Testing of simple cold cathode devices have been carried out. The device is based on a simple triode configuration. The proposed application is as a cold cathode ionization gauge for high and ultra high vacuum pressure measurements. Problems with total emitted current and current stability have been addressed through the testing of different insulating and metal gate materials as well as several triode configurations. Current measurements of greater than 10 milliamps have been realized.
机译:本文提出了改进的微波等离子体辅助化学气相沉积金刚石工艺制备的薄膜冷阴极上电子场发射测量结果。具体而言,该改性是由于向生长血浆中以不同的比例添加了氮和氧。薄膜在抛光的钼基板上生长。生长条件是恒定的甲烷(10%CH 4 / H 2 )和氢气(H 2 )浓度为60:40 T = 900–950°C。氮氧比N 2 / O 2 范围为1:1至50:1。另外,仅在氮气和氧气下生长膜。薄膜材料的表征已经通过X射线衍射,扫描电子显微镜,X射线光电子能谱,傅里叶变换红外光谱和拉曼光谱进行。结果表明,该材料是无序的四面体键合碳,晶体尺寸为 ≈ 10-100nm。材料的无序导致偏离金刚石晶格的立方对称性。这种对称破坏是堆叠缺陷和纳米孪生的结果。场发射结果表明,某些N 2 / O 2 比率和膜厚度显示出低开通场和冷阴极器件所需的电流密度。特别是,最理想的是N 2 / O 2 = 33–50,膜厚度= 1-2微米(μm)。导通电场低至1-2 V /μm,测量的电流密度> 1mA / cm 2 。将本研究中生长的薄膜与通过多激光工艺生长的多晶金刚石薄膜进行了比较。已经对简单的冷阴极装置进行了测试。该设备基于简单的三极管配置。拟议的应用是用于高和超高真空压力测量的冷阴极电离计。通过测试不同的绝缘和金属栅极材料以及几种三极管配置,已经解决了总发射电流和电流稳定性的问题。已经实现了大于10毫安的电流测量。

著录项

  • 作者

    Weiss, Brock Landon.;

  • 作者单位

    The Pennsylvania State University.;

  • 授予单位 The Pennsylvania State University.;
  • 学科 Engineering Materials Science.; Physics Condensed Matter.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 210 p.
  • 总页数 210
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;无线电电子学、电信技术;
  • 关键词

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