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Spectroscopic beam profile overlay metrology

机译:光谱光束轮廓叠加计量

摘要

A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.
机译:光谱光束轮廓计量系统同时检测大波长范围和大入射角(AOI)范围内的测量信号。一方面,将多波长照明光束整形为投射到覆盖物计量目标上的窄线形光束,使得线形光束的方向与覆盖物的光栅结构的延伸方向对准。计量目标。根据AOI在一个方向上并且根据波长在另一方向上将收集的光分散在检测器上。每个检测器像素处的测量信号与特定的AOI和波长相关联。收集的光包括一阶衍射光,零阶衍射光或其组合。在一些实施例中,在检测器的分开的区域上检测一阶衍射光和零阶衍射光。

著录项

  • 公开/公告号IL257866D0

    专利类型

  • 公开/公告日2018-05-31

    原文格式PDF

  • 申请/专利权人 KLA-TENCOR CORPORATION;

    申请/专利号IL20180257866

  • 发明设计人

    申请日2018-03-05

  • 分类号G03F;

  • 国家 IL

  • 入库时间 2022-08-21 12:52:21

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