HYBRID LASER AND IMPLANT TREATMENT FOR OVERLAY ERROR CORRECTION

摘要

Embodiments disclosed herein relate to methods and systems for correcting overlay errors on a surface of a substrate. A processor (604) performs a measurement process on a substrate (301) to obtain an overlay error map. The processor (604) determines an order of treatment for the substrate (301) based on the overlay error map (500). The order of treatment includes one or more treatment processes. The processor (604) generates a process recipe for a treatment process of the one or more treatment processes in the order of treatment. The processor (604) provides the process recipe to a substrate treatment apparatus.