A carrier for supporting at least one substrate during a sputter deposition process, an apparatus for sputter deposition on at least one substrate, and a method for sputter deposition on at least one substrate

摘要

A carrier (100) is provided for supporting at least one substrate during a sputter deposition process. The carrier 100 includes a carrier body 102, and an insulating portion provided on the carrier body 102. The isolation portion provides a surface 103 of electrically insulating material, wherein the surface 103 is configured to direct one or more sputter deposition sources during the sputter deposition process.