首页> 外国专利> Metal masks substrate for vapor deposition, metal mask for vapor deposition, production methods for metal masks substrate for vapor deposition and method for manufacturing metal mask for vapor deposition

Metal masks substrate for vapor deposition, metal mask for vapor deposition, production methods for metal masks substrate for vapor deposition and method for manufacturing metal mask for vapor deposition

机译:用于气相沉积的金属掩模基板,用于气相沉积的金属掩模,用于气相沉积的金属掩模基板的制造方法以及用于气相沉积的金属掩模的制造方法

摘要

A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.
机译:气相沉积金属掩模基板包括含镍金属板,该含镍金属板包括正面和与该正面相反的背面。正面和背面中的至少一个是用于放置抗蚀剂层的目标表面。目标表面的表面粗糙度Sa小于或等于0.019μm。目标表面的表面粗糙度Sz小于或等于0.308μm。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号