CHEMICAL VAPOR DEPOSITION OF DIFFUSION BARRIERS FOR ADVANCED METALLIZATION

摘要

IntroductionWhen Jack Kilby of Texas instrUmentS built theworld's first integrated circuit in 1958, the devicecontains only one transistOr Since then, integratedcircuitS have enjoyed tmpendous success in bothtechnology and business. The number of 'transistors oneach chip has been growing continuously due to theshrinking of device features. Todayl an advancedintegrated circuit device can Pack hundreds ofmillions transistors. TO connect these resistorstogether tO become a functioning chip is getting moreand m...