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Interface dynamics during Cu shadow-mask physical vapor deposition on nonmetallic substrates

机译:非金属基体上铜荫罩物理气相沉积过程中的界面动力学

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摘要

We have studied the interface dynamics during the growth of microscopic ordered Cu features deposited on different nonmetallic substrates by shadow-mask physical vapor deposition. Optical and atomic force microscopy data show the formation of either transparent or opaque patterned Cu depending on the film thickness. The evolution of the patterned film, the shadowed and the exposed regions, and the pattern shape are well described in terms of a continuous mesoscopic model, implying that masked deposition induces (through evaporation-condensation processes) an overall downhill current that results, under the small slope approximation, in Edwards-Wilkinson behavior.
机译:我们已经研究了通过荫罩物理气相沉积在不同的非金属基底上沉积的微观有序铜特征的生长过程中的界面动力学。光学和原子力显微镜数据显示取决于膜厚度的透明或不透明图案化Cu的形成。根据连续的介观模型,可以很好地描述图案化膜,阴影区域和曝光区域的演变以及图案形状,这意味着掩膜沉积会(通过蒸发-冷凝过程)引起整体下坡电流,该下坡电流在Edwards-Wilkinson行为中的小斜率近似。

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