首页> 外国专利> FLANGED OPTICAL ENDPOINT DETECTION WINDOWS AND CMP POLISHING PADS CONTAINING THEM

FLANGED OPTICAL ENDPOINT DETECTION WINDOWS AND CMP POLISHING PADS CONTAINING THEM

机译:法兰光学端点检测窗和包含它们的CMP抛光垫

摘要

To provide a CMP polishing pad having one or more endpoint detection windows for ensuring that no leak occurs, and a method for making the same.SOLUTION: In a chemical mechanical (CMP) polishing pad including a top surface, one or more apertures adapted to receive an endpoint detection window 14, an underside part having a recessed portion and having one or more flanged endpoint detection windows (windows), each window has a flange adapted to fit snugly into the recessed portion of the underside part of a polishing layer, the flange has thickness slightly less than depth of the recessed portion of the polishing layer (to allow for adhesive), has a detection area that fits snugly into an aperture in the polishing layer so that its top surface lies substantially flush with the top surface of the polishing layer.SELECTED DRAWING: Figure 1
机译:提供一种具有一个或多个端点检测窗口以确保不发生泄漏的CMP抛光垫及其制造方法。解决方案:在具有顶面的化学机械(CMP)抛光垫中,一个或多个孔适于接收端点检测窗14,其底侧部分具有凹进部分并且具有一个或多个凸缘的端点检测窗(窗口),每个窗口具有适于紧贴地配合到抛光层的底侧部分的凹进部分中的凸缘。凸缘的厚度略小于抛光层凹入部分的深度(允许粘接),其检测区域紧贴抛光层中的孔,使其顶面与顶面的顶面基本齐平。抛光层。选定的图纸:图1

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