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Method of manufacturing warpage corrector and fanout wafer level package

机译:翘曲校正器的制造方法和扇出晶圆级封装

摘要

[PROBLEMS] To provide a warpage correction material capable of reducing warpage of the WLP by adjusting the warpage amount at the temperature at the time of mounting the fan-out wafer level package (FO-WLP) or at room temperature such as wafer conveyance. [Solution] A warp correction material for a fan-out wafer level package, comprising a curable resin composition containing an active energy ray and a component that can be cured by heat, and curing the warp correction material with an active energy ray and heat. When the cured product is formed into a flat film, the linear expansion coefficient α (ppm / ° C.) at 25 ° C., elastic modulus β (GPa) at 25 ° C., and thickness γ (μm) at 25 ° C. are represented by the following relational formula: It is characterized by satisfying 2000 ≦ α × β × γ ≦ 10000.
机译:[问题]提供一种翘曲校正材料,该翘曲校正材料能够通过在安装扇出晶片级封装(FO-WLP)时的温度或诸如晶片运送的室温下调节翘曲量来减少WLP的翘曲。 [解决方案]一种用于扇出晶片级封装的翘曲校正材料,其包括:含有活性能量射线和可通过加热固化的组分的可固化树脂组合物,以及利用活性能量射线和热量来固化翘曲校正材料。将固化物形成为平坦膜时,在25℃下的线膨胀系数α(ppm /℃),在25℃下的弹性模量β(GPa)和在25℃的厚度γ(μm)。 C.由以下关系式表示:其特征在于满足2000≤α×β×γ≤10000。

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