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MOSFET LOGIC CELL FORMED OF A RADIANT MOSFETMETAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR

机译:辐射型金属氧化物半导体场效应晶体管构成的MOSFET逻辑单元

摘要

A logic cell formed of at least one MOSFET (METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR), the logic cell comprising: an N + layer and a plurality of P + layers formed around both sides or top and bottom sides of the N + layer; A plurality of I-gates that physically isolate between a P + layer and the N + layer, wherein a P active layer formed on the P + layer extends to a portion of the N + layer and is adjacent to the extended P active layer; An I gate N-type MOSFET having an N active layer formed on the layer, and at least one commercial P-type MOSFET adjacent to the I gate N-type MOSFET, wherein the logic cell is formed of the I gate N-type MOSFET. The N active layer size of the commercial process is formed to be the same as the size of the N active layer of the N-type MOSFET of the commercial process, the logic cell channel size of the commercial process It characterized by having the same channel size.
机译:一种逻辑单元,由至少一个MOSFET(金属氧化物半导体场效应晶体管)形成,该逻辑单元包括:N +层和围绕该N +层的两侧或顶侧和底侧形成的多个P +层;在P +层和N +层之间物理隔离的多个I-栅极,其中在P +层上形成的P有源层延伸到N +层的一部分并与延伸的P有源层相邻;一种I栅极N型MOSFET,具有在该层上形成的N有源层,以及与I栅极N型MOSFET相邻的至少一个商用P型MOSFET,其中逻辑单元由I栅极N型MOSFET形成。商业化工艺的N有源层尺寸形成为与商业化工艺的N型MOSFET的N有源层的尺寸相同,商业化工艺的逻辑单元沟道尺寸的特征在于具有相同的沟道尺寸。

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