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Semiconductor device including laterally diffused metal-oxide-semiconductor field effect transistor and method for manufacturing the same
Semiconductor device including laterally diffused metal-oxide-semiconductor field effect transistor and method for manufacturing the same
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机译:包括横向扩散的金属氧化物半导体场效应晶体管的半导体器件及其制造方法
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摘要
According to one embodiment, a semiconductor device includes a semiconductor device includes a first semiconductor region, a second semiconductor region, a third semiconductor region, an insulating unit, a void, a gate insulating film and a gate electrode. The second semiconductor region provides on a part of the first semiconductor region. The third semiconductor region provides on one other part of the first semiconductor region. The insulating unit provides on a part of the second semiconductor region. The void provides at a lower part of the insulating unit. The gate insulating film provides on a part of the first semiconductor region between the second semiconductor region and the third semiconductor region. The gate electrode provides on the gate insulating film. A position in a first direction of at least a part of the void is between the insulating unit and the third semiconductor region.
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