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Compensating for scanning electron microscope beam distortion-induced metrology error using design
Compensating for scanning electron microscope beam distortion-induced metrology error using design
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机译:使用设计补偿扫描电子显微镜光束畸变引起的计量误差
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摘要
Methods and systems for quantifying and correcting for non-uniformities in images used for metrology operations are disclosed. A metrology area image of a wafer and a design clip may be used. The metrology area image may be a scanning electron microscope image. The design clip may be the design clip of the wafer or a synthesized design clip. Tool distortions, including electron beam distortions, can be quantified and corrected. The design clip can be applied to the metrology area image to obtain a synthesized image such that one or more process change variations are suppressed and one or more tool distortions are enhanced.
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