首页> 外国专利> - NONVOLATILE CHARGE TRAP MEMORY DEVICE HAVING A DEUTERATED LAYER IN A MULTY-LAYER CHARGE-TRAPPING REGION

- NONVOLATILE CHARGE TRAP MEMORY DEVICE HAVING A DEUTERATED LAYER IN A MULTY-LAYER CHARGE-TRAPPING REGION

机译:-在多层电荷陷阱区域中具有去离子层的非易失性电荷陷阱存储器

摘要

The present invention relates to scaling charge trap memory devices and articles produced thereby. In one embodiment, the charge trap memory device includes a substrate having a source region, a drain region, and a channel region that electrically connects the source and drain. A tunnel dielectric layer is disposed on the channel region over the substrate, and a multi-layer charge-trapping region is disposed on the tunnel dielectric layer. The multi-layer charge-trapping zone comprises a first deuteration layer disposed on the tunnel dielectric layer, a first nitride layer disposed on the first deuteration layer, and a second nitride layer disposed on the first nitride layer. Includes.
机译:本发明涉及定标电荷陷阱存储器件和由此产生的物品。在一个实施例中,电荷陷阱存储器件包括衬底,该衬底具有源极区,漏极区和电连接源极和漏极的沟道区。隧道电介质层设置在衬底上方的沟道区上,并且多层电荷俘获区设置在隧道电介质层上。多层电荷俘获区包括设置在隧道介电层上的第一氘化层,设置在第一氘化层上的第一氮化物层和设置在第一氮化物层上的第二氮化物层。包括。

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