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Study of the interface shape of CdZnTe crystals grown by Vertical Bridgman for X-ray detector applications

机译:垂直布里奇曼生长的CdZnTe晶体在X射线探测器应用中的界面形状研究

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摘要

CdZnTe crystals are currently used for the preparation of X-ray detectors. However, the large-scale exploitation of CdZnTe-based detectors is limited by the low single crystalline yield of the available growth techniques. In particular, two problems connected with the growth process seem to be critical. The first one concerns with the first part of the growth: due to the presence of tellurium structures in the melt above the melting point, superheating is necessary, causing difficulties to standard seeding procedures. For this reason, unseeded growth is usually preferred, with the consequence that at least the first part of the growth is characterized by polycrystalline material. The second problem is connected with the difficulty to obtain a convex growth interface, basically because of the low thermal conductivity of CdZnTe crystals. This fact favors the development of spurious nuclei at the crucible walls. Some of the authors have recently proposed a modification of the vertical Bridgman technique that makes use of a boron oxide layer covering the melt during the growth. In this work, the growth interface of several CdZnTe crystals grown by the vertical Bridgman technique, with and without the use of boron oxide to cover the charge, has been studied mainly by means of pholuminescence mapping, optical microscopy, and EDS microanalysis. The results show that, even in the presence of a vertical thermal gradient of about 10?C/cm, considered ideal for achieving a good crystallization of CdZnTe crystals, nucleation often starts not from the lower tip of the crucible, but rather from lateral crucible walls. This seems to be due to a local modification of the thermal gradient due to the presence of the molten charge, the crucible, and the crucible support. Moreover, while the first part of the main body of the crystal is characterized by a convex interface, the second half is characterized by a concave interface in the case of crystals grown without encapsulant. On the contrary, if the melt is covered by boron oxide, the interface is convex up to the end of the growth. The explanation of this experimental evidence can be found in the different thermal conductivity of boron oxide and vapor and in the fact that boron oxide separates the melt from the convective flows in the vapor.
机译:CdZnTe晶体目前用于制备X射线探测器。但是,基于CdZnTe的探测器的大规模开发受到可用生长技术的低单晶产率的限制。特别是,与增长过程有关的两个问题似乎至关重要。第一个涉及生长的第一部分:由于在熔点以上的熔体中存在碲结构,因此有必要进行过热,从而给标准播种程序带来困难。因此,通常优选非种子生长,其结果是,至少生长的第一部分以多晶材料为特征。第二个问题与难以获得凸形生长界面有关,这主要是因为CdZnTe晶体的导热系数低。这一事实有利于在坩埚壁处形成伪核。一些作者最近提出了对垂直布里奇曼技术的改进,该技术利用了生长过程中覆盖熔体的氧化硼层。在这项工作中,主要通过光致发光图谱,光学显微镜和EDS显微分析研究了通过垂直Bridgman技术生长的几种CdZnTe晶体的生长界面,无论是否使用氧化硼来覆盖电荷。结果表明,即使存在大约10?C / cm的垂直热梯度,也被认为是实现CdZnTe晶体良好结晶的理想选择,成核通常不是从坩埚的下端开始,而是从横向坩埚开始墙壁。这似乎是由于熔融装料,坩埚和坩埚载体的存在而引起的热梯度的局部改变。此外,虽然晶体主体的第一部分的特征是凸形的界面,但是在晶体没有密封剂的情况下,第二部分的特征是凹形的界面。相反,如果熔体被氧化硼覆盖,则界面在生长结束之前是凸面的。该实验证据的解释可以从氧化硼和蒸气的不同热导率以及氧化硼将熔体与蒸气中的对流分开的事实中找到。

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