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Interface shape control and tellurium inclusion concentration distribution in CdZnTe crystals grown by vertical Bridgman for X-ray detector applications

机译:垂直布里奇曼生长的CdZnTe晶体在X射线探测器应用中的界面形状控制和碲中夹杂物浓度分布

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摘要

In spite of the efforts devoted to the task, many problems connected with the growth of CdZnTe (Zn>0) crystals are still unresolved, in particular tellurium inclusion density control, large single crystalline yield, seeding, and interface shape control. Moreover, also the electrical properties of the crystals (high resistivity and mobility-lifetime product) must be taken into account if detector performances have to be improved. In this work, the authors report on the growth and characterization of several CdZnTe crystals (Zn=10%) by vertical Bridgman, with and without the use of boron oxide as encapsulant. Different techniques were used to characterize the crystals: i) PL mapping for determining interface shape and to study the nucleation ii) a novel IR mapping apparatus to obtain fully 3D reconstruction of the inclusion distribution iii) X-ray detector characterization by means of nuclear sources to study the transport properties of the material (with mobility-lifetime product for electrons up to 6x10-3 cm2/V).
机译:尽管为此付出了很多努力,但仍未解决与CdZnTe(Zn> 0)晶体生长有关的许多问题,特别是碲的夹杂物密度控制,大的单晶产率,晶种和界面形状控制。此外,如果必须提高检测器的性能,还必须考虑晶体的电性能(高电阻率和迁移率-寿命产物)。在这项工作中,作者报告了使用和不使用氧化硼作为密封剂时,垂直布里奇曼生长和表征了几种CdZnTe晶体(Zn = 10%)的特性。使用了不同的技术来表征晶体:i)PL映射用于确定界面形状并研究成核作用ii)一种新颖的IR映射设备以获得对夹杂物分布的完整3D重建iii)X射线探测器通过核源进行表征研究材料的传输特性(电子的迁移率-终生乘积高达6x10-3 cm2 / V)。

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