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Preparation and Characterization of Antimony Doped Tin Oxide Thin Films Synthesized by Co-Evaporation of Sn and Sb using Plasma Assisted Thermal Evaporation

机译:等离子体辅助热蒸发法共蒸镀锡和锑的锑掺杂氧化锡薄膜的制备与表征

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摘要

Tin oxide (SnO2) thin films are having promising properties such as high visible transmittance and low electric resistivity, makes them very important transparent conductor in a variety of optoelectronics devices. Further, doping with pentavalent impurity such as Antimony (Sb) enhances its conductivity considerably. In order to study the effect of Antimony doping, Antimony doped tin oxide (SnO2 : Sb) thin films have been prepared by the co-evaporation of Sn and Sb using Plasma Assisted Thermal Evaporation (PATE) in oxygen (O2) partial pressure at various doping level from 4% to 25%. The influence of various Sb doping levels on the compositional, electrical, optical and structural properties have been investigated using Energy Dispersive X-ray (EDX) spectroscopy, Ultraviolet-Visible (UV-VIS) transmission spectroscopy, four-probe resistivity measurement and X-ray Diffraction (XRD), respectively. EDX studies confirmed the different Sb doping levels in the grown films from 4 % to 25 %, while electrical resistivity is obtained in range of 0.36 to 9.5 Ohmcm using four-probe setup for 4 % to 25 % Sb doping levels. Transmittance spectra measured in UV-VIS range for Sb doped films show reduction in an average transmittance in respect to increase in Sb doping levels in the grown films. Whereas, XRD analysis reveals that higher Sb doping of 25 % induce the precipitation of antimony oxide (Sb2O3) phase and its precipitation suppressed the growth of SnO2 peaks as well as responsible for reduction in conductivity and transparency. The best electrical resistivity of optimized SnO2 : Sb (5 %) is 0.36 Ohmcm without deteriorating the high (~ 80 %) average transmittance in the wavelength region 300-800 nm in comparison to undoped SnO2 film (6.57 Ohmcm) , confirm the usefulness of SnO2 : Sb (5 %) films for device applications.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/31025
机译:氧化锡(SnO2)薄膜具有令人鼓舞的性能,例如高可见光透射率和低电阻率,使其成为各种光电器件中非常重要的透明导体。此外,掺杂五价杂质如锑(Sb)可以大大提高其导电性。为了研究锑掺杂的效果,通过在氧气(O2)分压下在不同的氧气(O2)分压下,通过等离子体辅助热蒸发(PATE)共蒸发Sn和Sb来制备锑掺杂的氧化锡(SnO2:Sb)薄膜。掺杂水平从4%降至25%。使用能量色散X射线(EDX)光谱,紫外可见(UV-VIS)透射光谱,四探针电阻率测量和X-X光谱研究了各种Sb掺杂水平对成分,电,光学和结构性质的影响。射线衍射(XRD)分别。 EDX研究证实,在生长的薄膜中,Sb的掺杂水平从4%到25%不等,而使用4%到25%的Sb掺杂水平的四探针设置可获得的电阻率为0.36到9.5Ohmcm。在Sb掺杂薄膜的UV-VIS范围内测得的透射光谱表明,相对于生长薄膜中Sb掺杂水平的提高,平均透射率降低。而XRD分析表明,较高的Sb掺杂量为25%会引起氧化锑(Sb2O3)相的沉淀,其沉淀抑制了SnO2峰的生长,并导致电导率和透明性降低。与未掺杂的SnO2膜(6.57 Ohm?cm)相比,优化的SnO2:Sb(5%)的最佳电阻率为0.36 Ohm?cm,而不会降低300-800 nm波长区域中的高(〜80%)平均透射率,确认SnO2:Sb(5%)膜对设备应用的有用性。在引用本文档时,请使用以下链接http://essuir.sumdu.edu.ua/handle/123456789/31025

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