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Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists

机译：包含食品染料的可见光光敏光酸产生剂，用于化学放大抗蚀剂

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Naohiro Tarumoto; Nobukazu Miyagawa; Shigeru Takahara; Tsuguo Yamaoka;
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年度 2005
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1. Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists [J] . Naohiro Tarumoto, Nobukazu Miyagawa, Shigeru Takahara, Journal of Photopolymer Science and Technology . 2005,第6期

机译：可见光光敏酸产生剂，结合食用染料，用于化学放大抗蚀剂
2. Diphenyliodonium Salts with Diazoxide Group for a Photo-acid Generator in Chemically Amplified Resist [J] . Naohiro Tarumoto, Nobukazu Miyagawa, Shigeru Takahara, Journal of Photopolymer Science and Technology . 2003,第5期

机译：具有二氮嗪基的二苯基碘鎓盐，用于化学增强抗蚀剂中的光致产酸剂
3. Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography [J] . Kenneth E. Gonsalves, Mingxing Wang, Cheng-Tsung Lee Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2009,第18期

机译：新型化学放大型抗蚀剂，结合了阴离子光酸产生剂官能团，可用于低于50 nm的半节距光刻
4. Photoacid generation in chemically amplified resists: elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring acid generation [C] . James F. Cameron, J. Michael Mori, Thomas M. Zydowsky, Conference on advances in resist technology and processing . 1998

机译：化学放大抗蚀剂的光酸生成：利用新的酸性敏感染料来阐明光酸发生器的结构效果，用于监测酸产生
5. Surface chemistry study of gallium arsenide wafers during chemically amplified resist patterning and resist studies with fluorescence. [D] . Lu, Bing. 2000

机译：砷化镓晶片的表面化学研究在化学放大的抗蚀剂构图过程中进行，并通过荧光进行抗蚀剂研究。
6. Investigations of new potential photo-acid generators: crystal structures of 2-(E)-2-phenylethenylphenol (orthorhombic polymorph) and (2E)-3-(2-bromophenyl)-2-phenylprop-2-enoic acid [O] . William T. A. Harrison, M. John Plater, Lee J. Yin 2016

机译：新的潜在光产酸剂的研究：2-（（E）-2-苯基乙炔基苯酚（正交多晶型）和（2E）-3-（2-溴苯基）-2-苯基丙-2-烯酸的晶体结构
7. Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists [O] . Takehiro Fukuyam, Takahiro Kozawa, Hiroki Yamamoto, 2009

机译：聚合物保护与薄膜厚度对化学放大抗蚀剂酸发电机分布的影响

Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists

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